ACTIVITITES
a. Laboratory for silicon processing
Available processes include:

• Thermal processes (high temperature oxidation, annealing, diffusion)
  
• Ion implantation
  
• Optical and electron beam lithography
  
• Chemical and Reactive Ion Etching
  
• Deposition of dielectrics, metals and polycrystalline silicon
  

b. Materials, process and device characterization (electrical, optical, structural)
c. Process and device modelling
d. Sensor fabrication, characterization and testing
e. Consulting in Microelectronics, Microsystems and microelectromecahnical Sensors (MEMs).

ACCESSIBLE INFRASTRUCTURE

• Silicon processing equipment
  
• Clean Room
  
• Laminar flow chemical benches
  
• Thermal Processing
  
  • 7 horizontal Tempress hot-wall furnace tubes
    
• Chemical Vapour Deposition
  
  • 2 horizontal Tempress LPCVD reactors
    
  • 1 horizontal Tempress PECVD reactor
    
• Ion Implantation
  
• Optical Lithography systems
  
  • UV GCA H-line Wafer Stepper
    
  • Karl Suss MA6 double-side I-line mask aligner
    
  • Karl Suss MJB3 contact mask aligner
    
  • Headway Research EC 101 D Spinner
    
  • Karl Suss Spinner
    
  • 2 ATV Technology hot plates
    
• Electron beam lithography system
  
• Plasma Processing systems
  
  • Alcatel Nextral NE 330 Reactive Ion Etcher
    
  • High density plasma processing system
    
• Metallization equipment
  
  • Oxford Applied Research DS 210 DC and RF sputtering system
    
  • Denton Vacuum electron gun evaporator
    
  • Alcatel thermal evaporator
    
• Process Inspection equipment
  
  • Gaertner Scientific L116 BLC-85B ellipsometer
    
  • Jena Jenavert optical microscope
    
  • Bausch & Lomb Microzoom-FS optical microscope
    
  • Veeco Instruments 4-point probe resistivity meter
    
• Characterisation equipment
  
• Electrical Characterisation instruments
  
  • HP 4142B modular DC source / monitor
    
  • HP 4084B switching matrix controller
    
  • HP 3488A switch control unit
    
  • HP 8110A pulse generator up to 150 MHz
    
  • HP 700i series data acquisition system
    
  • HP 4140B pA meter / dc voltage source
    
  • HP 4284 admittance meter
    
  • HP 4192A impedance analyser
    
  • HP 34401 multimeter
    
  • HP 16500A logic analysis system
    
  • Keithley 230 programmable voltage source
    
  • Keithley 220 programmable current source
    
  • Keithley 617 programmable electrometer
    
  • Keithley 195A digital multimeter
    
  • Keithley 6517A electrometer / high resistance meter
    
  • Tektronix 2245 100MHz oscilloscope
    
  • Oxford Optistat Cryostat for temperatures of 3.8*K to 320*K
    
  • Oxford DN Cryostat for temperatures of 76*K to 500*K
    
• Probe Stations
  
  • Karl Suss PA 150 semiautomatic probe station
    
  • Karl Suss manual probe station
    
  • Micromanipulator manual probe station
    
• Microscopy Equipment
  
  • Scanning Electron Microscope (Leo No 440 )
    
  • STM/AFM microscope
    
  • Optical Microscopes
    
• Other equipment items and modelling tools
  
• Packaging equipment
  
  • General Signal 602 M wafer saw
    
  • Kulicke & Soffa 648-1 die bonder
    
  • Precimeca Semi-automatic 431 wire bonder
    
• Chemistry laboratory
  
  • Headway Research I-PM-1010D-CB15 spinner
    
  • Cole Palmer L-05053-22 vacuum oven
    
  • Memmert oven
    
  • ATV Technology precision hot plate
    
  • 2 SBS magnetic stirrers / hot plates
    
  • Oriel 500 W deep UV exposure system
    
  • Perking Elmer Lambda 40 UV Visible spectrophotometer
    
  • Ohaus E15000 weighing balance
    
  • Sartorius weighing balance
    
• Sensor characterisation and silicon micromachining equipment
  
  • Gas flow measurement & testing system
    
  • Pressure measurements and testing system
    
  • Logitech PM4 precision chemical-mechanical lapping and polishing machine
    
• Modelling Tools
  
• Silvaco Athena
  
• Silvaco Atlas
  
• MEMCAD

PRODUCTS AVAILABLE:

• Silicon gas, flow and pressure sensors
  
• silicon, x-ray and particle detectors
  

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ACTIVITITES

• Silicon quantum wires and quantum dots
  
• Superlattices of nanocrystalline (nc) Si/SiO2 and nc-Si/CaF2
  
• Optical and transport properties
  
• Applications in memory devices and silicon-based optoelectronics

ACCESSIBLE INFRASTRUCTURE

• Fully operational C-MOS line, equipped with Ion implanter, chemical benches, furnaces for thermal processing, lithography, etching and deposition of dielectrics, polycrystalline silicon and metals. Electron beam lithography is also available
  
• Fully equipped laboratory for electrical (I-V, C-V) and optical measurements (photo- and electroluminescence) at room and low temperatures
  
• Scanning electron microscopy, STM/AFM
  
• Process and device simulation (SILVACO TOOLS)

SERVICE PROVIDED/PRODUCTS AVAILABLE
Services in nanotechnology, products: nanocrystalline silicon in different matrices, nanoelectronic devices

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ACTIVITITES

• Development of silicon integrated sensors, compatible with C-MOS processing
  
• Development of surface and bulk silicon micromachining techniques
  
• Sensor characterisation and testing. Modelling of their operation.

ACCESSIBLE INFRASTRUCTURE

• Fully operational C-MOS line, equipped with Ion implanter, chemical benches, furnaces for thermal processing lithography, etching and deposition of dielectrics, polycrystalline silicon and metals/Electron beam lithography is also available
  
• Equipment of characterization and testing of gas and flow sensors
  
• Software for sensors modeling (MEMCAD)

SERVICE PROVIDED
Services are provided in the following:

• Bulk silicon micromachining for sensor applications. Suspended polycrystalline and monocrystalline silicon membranes and cantilevers. Deep cavities into silicon may be fabricated
  
• Silicon processing services
  
• Small volume production of gas and flow sensors

PRODUCTS

• Novel integrated gas flow sensor (patent), based on bulk silicon micromachining
  
• Bulk silicon micromachining technique (proprietary process), based on the use of porous silicon as a sacrificial layer.
  

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ACTIVITITES

• C-MOS macrocell and system-on-chip (SOC) IC design for low voltage low power applications.
  
• Development of design methodologies for power estimation in digital ICs
  
• CMOS analogue/mixed IC and system design for solid state sensor/detector and picture recognition applications
  
• Silicon monolithic IC design for optoelectronic applications

ACCESSIBLE INFRASTRUCTURE
State-of-the-art VLSI design tools such as Mentor Graphics, Cadence, Synopsys are available. Probe stations and ancillary equipment for testing are also available

SERVICE PROVIDED/PRODUCTS

• Application Specific analog/digital and mixed IC (ASIC) design
  
• Application Specific Integrated Processor (ASIP) design
  
• System-On-Chip (SOC) IC design

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